发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 A radiation-sensitive resin composition includes a polymer and a photoacid generator. The polymer includes a first structural unit shown by a formula (a1), a second structural unit shown by a formula (a2), and a third structural unit having a lactone structure. A content of the first structural unit in the polymer being 50 mol % or more based on total structural units included in the polymer. The first structural unit is preferably a structural unit shown by a formula (a1-1).
申请公布号 US2013022926(A1) 申请公布日期 2013.01.24
申请号 US201213629769 申请日期 2012.09.28
申请人 JSR CORPORATION;JSR CORPORATION 发明人 TOMIOKA HIROSHI;OTSUKA NOBORU;SOYANO AKIMASA
分类号 G03F7/027;G03F7/004 主分类号 G03F7/027
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