发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
A radiation-sensitive resin composition includes a polymer and a photoacid generator. The polymer includes a first structural unit shown by a formula (a1), a second structural unit shown by a formula (a2), and a third structural unit having a lactone structure. A content of the first structural unit in the polymer being 50 mol % or more based on total structural units included in the polymer. The first structural unit is preferably a structural unit shown by a formula (a1-1).
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申请公布号 |
US2013022926(A1) |
申请公布日期 |
2013.01.24 |
申请号 |
US201213629769 |
申请日期 |
2012.09.28 |
申请人 |
JSR CORPORATION;JSR CORPORATION |
发明人 |
TOMIOKA HIROSHI;OTSUKA NOBORU;SOYANO AKIMASA |
分类号 |
G03F7/027;G03F7/004 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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