发明名称 USE OF FREESTANDING NITRIDE VENEERS IN SEMICONDUCTOR DEVICES
摘要 Thin freestanding nitride veneers can be used for the fabrication of semiconductor devices. These veneers are typically less than 100 microns thick. The use of thin veneers also eliminates the need for subsequent wafer thinning for improved thermal performance and 3D packaging.
申请公布号 US2013019927(A1) 申请公布日期 2013.01.24
申请号 US201213555082 申请日期 2012.07.21
申请人 ZIMMERMAN SCOTT M.;LIVESAY WILLIAM R.;ROSS RICHARD L. 发明人 ZIMMERMAN SCOTT M.;LIVESAY WILLIAM R.;ROSS RICHARD L.
分类号 C01B21/00;B32B9/00;B32B9/04;B32B15/04;C01B21/06;H01L31/0264 主分类号 C01B21/00
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