| 发明名称 |
SUBSTRATE STAGE, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate stage capable of exposing an edge region of a substrate while a liquid immersion region is formed well when subjecting the edge region of a substrate to liquid immersion exposure. <P>SOLUTION: A substrate stage can be moved while holding a substrate as an exposure object. The substrate stage comprises: a first circumferential wall; a second circumferential wall formed inside the first circumferential wall; and a support part formed inside the second circumferential wall. The substrate stage holds a substrate to the support part by setting space surrounded by the second circumferential wall at negative pressure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013016839(A) |
申请公布日期 |
2013.01.24 |
| 申请号 |
JP20120193619 |
申请日期 |
2012.09.03 |
| 申请人 |
NIKON CORP |
发明人 |
YAMATO SOICHI;UMAGOME NOBUTAKA;HIRUKAWA SHIGERU;KUDO YOSHIHIKO;INOUE JIRO;KONO HIROTAKA;NEI MASAHIRO;IMAI MOTOMASA;NAGASAKA HIROYUKI;SHIRAISHI KENICHI;NISHII YASUFUMI;TAKAIWA HIROAKI |
| 分类号 |
H01L21/027;G03F7/20;H01L21/683 |
主分类号 |
H01L21/027 |
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