发明名称 METHOD FOR PRODUCING SEMICONDUCTOR PORCELAIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a semiconductor porcelain composition which can shift the Curie temperature in a positive direction without using Pb and obtain a semiconductor porcelain composition whose resistivity at room temperature is greatly reduced, and a method for producing a semiconductor porcelain composition which can impart a uniform property also to the interior of a material with no complex heat treatment even if the material has a shape of a relatively great thickness. <P>SOLUTION: In this method for producing a semiconductor porcelain composition which has a compositional formula represented by [(Bi<SB POS="POST">0.5</SB>Na<SB POS="POST">0.5</SB>)<SB POS="POST">x</SB>(Ba<SB POS="POST">1-y</SB>R<SB POS="POST">y</SB>)<SB POS="POST">1-x</SB>]TiO<SB POS="POST">3</SB>(where R is at least one of La, Dy, Eu, Gd, Y; and x and y satisfy 0<x&le;0.14, 0.002<y&le;0.02) the sintering of the composition is carried out in an inert gas atmosphere having oxygen concentration of 1% or less, and thus, the resistivity at room temperature can be remarkably reduced and an uniform property can be imparted also to the interior of the resultant material. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013014508(A) 申请公布日期 2013.01.24
申请号 JP20120173673 申请日期 2012.08.06
申请人 HITACHI METALS LTD 发明人 SHIMADA TAKESHI;TERAO KOICHI;TAJI KAZUYA
分类号 C04B35/468;H01C7/02 主分类号 C04B35/468
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