| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing technology which can inhibit susceptor deformation even in a high temperature treatment. <P>SOLUTION: A substrate processing apparatus comprises: a loading body on which a substrate is loaded; a loading body support supporting a plurality of loading bodies; a reaction tube housing the loading body support; and a heating part provided on the outside of the reaction tube for heating the substrate housed in the reaction tube. A surface of the loading body, which contacts the substrate and a surface of the loading body, which contacts the loading body support are subject to surface process so as to have the same level of roughness. <P>COPYRIGHT: (C)2013,JPO&INPIT |
