发明名称 PATTERN FORMATION APPARATUS, PAINTING DEVELOPMENT APPARATUS, SUBSTRATE TRANSFER METHOD USING THE SAME, AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a pattern formation apparatus and a painting development apparatus, being advantageous in improvement of a transfer throughput of a substrate between the pattern formation apparatus and the painting development apparatus. <P>SOLUTION: The pattern formation apparatus performs delivery of a substrate to/from an adjoining painting development apparatus. A first control part on the pattern formation apparatus side, when starting a pattern formation process on a substrate, transmits a first signal (S41-2) which predicts a new substrate delivery to a second control part on the painting development apparatus side at the time when operation of a first transfer hand 35 is started or thereafter, and which causes starting of operation of a second transfer hand 52 in advance. During operation of the second transfer hand 52, the first control part transmits a second signal (S41-4) requiring operation of the second transfer hand 52. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013016704(A) 申请公布日期 2013.01.24
申请号 JP20110149420 申请日期 2011.07.05
申请人 CANON INC 发明人 TANAKA AKIRA
分类号 H01L21/027;G03F7/16;G03F7/30;H01L21/677 主分类号 H01L21/027
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