发明名称 Gas scrubber used in fabricating semiconductor devices and gas filtering method using the same
摘要 A gas scrubber used in fabricating semiconductor devices and a filtering method using the same are provided. The gas scrubber contains a flange having an inlet on the upper surface thereof, a hollow housing combined at one end with the outer circumferential surface of the flange, a cup-shaped filter housed inside the hollow housing, for filtering impurities flowing through the inlet, and pillar type filter supporters mounted on the lower surface of the flange, for maintaining the shape of the filter. Here, powders to be filtered are filtered by passing from the exterior of the filter to the interior thereof and the shape of the filter is maintained by the pillar type filter supporters. Thus, the life of the filter can be prolonged so that the costs of manufacturing a semiconductor device are reduced.
申请公布号 US5865879(A) 申请公布日期 1999.02.02
申请号 US19960770439 申请日期 1996.12.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, YE-SEUNG
分类号 B01D46/00;B01D46/02;B01D53/86;H01L21/304;(IPC1-7):B01D46/02 主分类号 B01D46/00
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