发明名称 METHOD OF STABILIZING HYDROGENATED AMORPHOUS SILICON AND AMORPHOUS HYDROGENATED SILICON ALLOYS
摘要 <p>A method of forming a semiconductor material of a photovoltaic device that includes providing a surface of a hydrogenated amorphous silicon containing material, and annealing the hydrogenated amorphous silicon containing material in a deuterium containing atmosphere. Deuterium from the deuterium-containing atmosphere is introduced to the lattice of the hydrogenated amorphous silicon containing material through the surface of the hydrogenated amorphous silicon containing material. In some embodiments, the deuterium that is introduced to the lattice of the hydrogenated amorphous silicon containing material increases the stability of the hydrogenated amorphous silicon containing material.</p>
申请公布号 WO2013012454(A1) 申请公布日期 2013.01.24
申请号 WO2012US28686 申请日期 2012.03.12
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;HEKMATSHOAR-TABARI, BAHMAN;HOPSTAKEN, MARINUS;PARK, DAE-GYU;SADANA, DEVENDRA K.;SHAHIDI, GHAVAM G.;SHAHRJERDI, DAVOOD 发明人 HEKMATSHOAR-TABARI, BAHMAN;HOPSTAKEN, MARINUS;PARK, DAE-GYU;SADANA, DEVENDRA K.;SHAHIDI, GHAVAM G.;SHAHRJERDI, DAVOOD
分类号 H01L21/265 主分类号 H01L21/265
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