发明名称 CERAMICS WIRING SUBSTRATE AND SEMICONDUCTOR DEVICE USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a ceramics wiring substrate which suppresses reduction of joint strength of a semiconductor device. <P>SOLUTION: A ceramics wiring substrate 10 comprises a ceramics substrate 11 and a wiring layer 12 formed thereon. The wiring layer 12 comprises: a wiring part 13 including a foundation metal layer 15, a first diffusion prevention layer 16, and a first Au layer 17 sequentially stacked on a surface of the ceramics substrate 11; and a connection part 14 including a second diffusion prevention layer 19, a hole suppression layer 20, and a solder layer 18 sequentially stacked in a desired position on the wiring part 13. The hole suppression layer 20 is formed of Au or an Au-Sn alloy containing 85 mass% of Au. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013016838(A) 申请公布日期 2013.01.24
申请号 JP20120193144 申请日期 2012.09.03
申请人 TOSHIBA CORP;TOSHIBA MATERIALS CO LTD 发明人 NAKAMURA MIHO;FUKUDA ETSUYUKI
分类号 H01L23/13;H01L21/52;H01L23/15;H05K1/09;H05K3/24 主分类号 H01L23/13
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