发明名称 |
PRESSURE TRANSMITTER FOR A SEMICONDUCTOR PROCESSING ENVIRONMENT |
摘要 |
Embodiments related to measuring process pressure in low-pressure semiconductor processing environments are provided. In one example, a semiconductor processing module for processing a substrate with a process gas in a vacuum chamber is provided. The example module includes a reactor positioned within the vacuum chamber for processing the substrate with the process gas and a pressure-sensitive structure operative to transmit a pressure transmission fluid pressure to a location exterior to the vacuum chamber. In this example, the pressure transmission fluid pressure varies in response to the process gas pressure within the vacuum chamber.
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申请公布号 |
US2013023129(A1) |
申请公布日期 |
2013.01.24 |
申请号 |
US201113187300 |
申请日期 |
2011.07.20 |
申请人 |
ASM AMERICA, INC.;REED JOSEPH CHARLES |
发明人 |
REED JOSEPH CHARLES |
分类号 |
H01L21/30;C23C16/455;C23C16/52 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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