LIGHT EXPOSURE APPARATUS AND METHOD OF CONTROLLING THE SAME

摘要

The present invention relates to a method of controlling a light exposure apparatus including an exposure beam generator equipped with a prism or a bend minor and a vacuum chamber through which light generated in the exposure beam generator passes. The method includes, generating an exposure beam; measuring a deviation of a center of the exposure beam from a reference line in the vacuum chamber; and adjusting the prism or the bend minor in the exposure beam generator to adjust the center of the exposure beam when the center of the exposure beam is misaligned with the reference line.