发明名称 |
CHEMICAL VAPOR DEPOSITION AND METHOD OF MANUFACTURING LIGHT-EMITTING DEVICE USING CHEMICAL VAPOR DEPOSITION |
摘要 |
A chemical vapor deposition (CVD) method includes forming a first semiconductor layer on a substrate that is mounted on a satellite disk at a first process temperature; and forming a second semiconductor layer on the first semiconductor layer at a second process temperature. Also, a method of manufacturing a light-emitting device (LED) includes: forming a quantum well layer on a substrate that is mounted on a satellite disk at a first process temperature; and forming a quantum barrier layer on the quantum well layer at a second process temperature.
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申请公布号 |
US2013023080(A1) |
申请公布日期 |
2013.01.24 |
申请号 |
US201213358189 |
申请日期 |
2012.01.25 |
申请人 |
KIM BUM-JOON;KIM KI-SUNG;KIM YOUNG-SUN;KO DOEK-GIL;LIM JIN-YOUNG;JEONG EUI-JOON |
发明人 |
KIM BUM-JOON;KIM KI-SUNG;KIM YOUNG-SUN;KO DOEK-GIL;LIM JIN-YOUNG;JEONG EUI-JOON |
分类号 |
H01L21/205;H01L33/06 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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