发明名称 EXPOSURE DEVICE, EXPOSURE METHOD, METHOD FOR MANUFACTURING DEVICE, PROGRAM AND RECORDING MEDIUM
摘要 <p>This exposure device exposes a substrate to exposure light through a liquid. This exposure device is provided with: an optical member that has an emission surface from which the exposure light is emitted; a substrate holding device which comprises a first holding part that holds the lower surface of the substrate in a releasable manner and a first member that defines an opening, in which the substrate can be arranged, and has an upper surface that is arranged around the upper surface of the substrate in a state where the substrate is held by the first holding part; and a porous member at least a part of which is arranged in a space between the substrate and the first member and which has an upper surface that is liquid repellent with respect to the liquid. The exposure device recovers, through the porous member, at least some of the liquid flowed into the space.</p>
申请公布号 WO2013012032(A1) 申请公布日期 2013.01.24
申请号 WO2012JP68316 申请日期 2012.07.19
申请人 NIKON CORPORATION;SATO SHINJI 发明人 SATO SHINJI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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