ELECTROSTATIC CHUCK ASSEMBLY WITH DIELECTRIC MATERIAL AND/OR CAVITY HAVING VARYING THICKNESS, PROFILE AND/OR SHAPE, METHOD OF USING THE SAME AND APPARATUS INCORPORATING THE SAME

摘要

PROBLEM TO BE SOLVED: To improve the uniformity of an electric flux above a workpiece during a plasma processing process.

SOLUTION: An electrostatic chuck assembly 100 having a dielectric material 108 and/or having a cavity 106 with varying thickness, profile and/or shape includes a conductive support 102 and an electrostatic chuck ceramic layer 104. A dielectric layer or an insert 108 is located between the conductive support 102 and the electrostatic chuck ceramic layer 104. A cavity 106 is located in a seating surface of the electrostatic chuck ceramic layer 104. An embedded pole pattern can be optionally incorporated in the electrostatic chuck assembly.

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