SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM WITH PROGRAM FOR EXECUTING SUBSTRATE PROCESSING METHOD RECORDED

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing device capable of accurately detecting a holding state of a substrate without being affected by the film type of the substrate, a surface state, a detection position of the substrate or the like.

SOLUTION: A substrate processing device for processing a substrate includes: a mount base 32 on which the substrate is mounted; a rotation part 35 which rotates the mount base 32 together with the substrate; a light source 88 which irradiates the surface of the substrate with light; a detection section 89 which detects the light amount of light irradiating the surface of the substrate and reflected by the surface thereof; and a control section 100 which controls operation of the rotation part 35 and the detection section 89. When a plurality of determination processing for determining whether or not a detection value of the detected light amount is smaller than a predetermined value are performed while a detection position of the substrate is changed by the rotation part 35, and the total number of times in which the detection value is smaller than the predetermined value reaches the predetermined number of times, the control section 100 determines that a holding state of the substrate is not normal.

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