发明名称 METHOD FOR FORMING EFFECTIVE APERTURE IN POSITIVE RESIST LAYER ON OPTICAL SURFACE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming effective apertures of different sizes in positive resist layers on optical surfaces of a plurality of lenses that are stacked to constitute a group of photographing optical system, by a single exposure process. <P>SOLUTION: Lens arrays 11 to 13 having light-shielding films formed on front and back surfaces thereof and having a plurality of lenses 14, 22, 23 formed therein, respectively, are stacked. A light source 30 that exits parallel beams is rotated in 360 degrees around an optical axis 40, at an appropriately selected inclination angle between 0 and &theta;/2 (&theta; represents a photographing angle of view of the lenses) with respect to the optical axis, to irradiate the lens arrays so as to expose the whole range within the effective diameters of the all lenses. The light-shielding films in the exposed range are removed by a developing process to form effective apertures in the respective optical surfaces. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013015675(A) 申请公布日期 2013.01.24
申请号 JP20110148355 申请日期 2011.07.04
申请人 FUJIFILM CORP 发明人 MATSUNO AKIRA;YONEYAMA SATOSHI;KOIKE MICHIJI;HASEGAWA KAZUHIDE
分类号 G02B3/00 主分类号 G02B3/00
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