发明名称 |
DEPOSITION SOURCE AND DEPOSITION APPARATUS INCLUDING THE SAME |
摘要 |
A deposition source including: a dopant vaporization source; a first host vaporization source including a first vaporization source unit on a side of the dopant vaporization source and a second vaporization source unit on another side of the dopant vaporization source; and a second host vaporization source including a third vaporization source unit on the side of the dopant vaporization source and arranged in parallel with the first vaporization source unit, and a fourth vaporization source unit on the another side of the dopant vaporization source and arranged in parallel with the second vaporization source unit.
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申请公布号 |
US2013019805(A1) |
申请公布日期 |
2013.01.24 |
申请号 |
US201213413615 |
申请日期 |
2012.03.06 |
申请人 |
LEE JONG-WOO;CHO YOUNG-SOO |
发明人 |
LEE JONG-WOO;CHO YOUNG-SOO |
分类号 |
C23C16/448 |
主分类号 |
C23C16/448 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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