| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a nanoimprint mold that can be repetitively reproduced while suppressing variations in dimension of a region having a pattern. <P>SOLUTION: A pattern resin part 40 made of resin, which is provided on an upper surface 12a of a second mesa part 12 in a glass mold 1, has a pattern P. Therefore, when dirt and scratch occur on the pattern P due to repetitive use of a nanoimprint mold 50, the nanoimprint mold 50 can be reproduced by removing only the pattern resin part 40 by performing oxygen ashing or the like. Further, the pattern resin part 40 is formed of a replica resin 30 applied to the upper surface 12a of the second mesa part 12 protruded from a major surface 1a of the glass mold 1. Therefore, when the nanoimprint mold 50 is repetitively reproduced, the dimension of a pattern region having the pattern P is fixed to the dimension of the upper surface 12a of the second mesa part 12 without variations. <P>COPYRIGHT: (C)2013,JPO&INPIT |
