发明名称 Device for Vacuum Deposition with Recharging Reservoir and Corresponding Vacuum Deposition Method
摘要 A vacuum deposition apparatus comprising an enclosure adapted to receive a substrate to be treated and placed under a vacuum; at least one injector that generates a molecular beam of vapor of an organic material the injector comprising a conduit located inside the enclosure and traversing an injection wall of the enclosure to form an outer nozzle adapted in such a manner as to be hermetically connected in a detachable manner to an organic material supply, wherein the supply is a bottle whose neck is adapted to be introduced into the nozzle; an outer heating apparatus located on both sides of an injection wall and surrounding the bottle; an inner heating apparatus surrounding the conduit; and a regulatable valve permitting regulation of conductance of the injector in the enclosure.
申请公布号 KR101225867(B1) 申请公布日期 2013.01.24
申请号 KR20077015349 申请日期 2005.12.07
申请人 发明人
分类号 C23C14/24 主分类号 C23C14/24
代理机构 代理人
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