| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposing apparatus that prevents the occurrence of defective exposure due to temperature change and prevents a decline in operation rate. <P>SOLUTION: The exposing apparatus exposes a substrate by an exposure light by means of a liquid. The apparatus includes: an optical member to emit an exposure light; a liquid inlet to supply a liquid so that an optical path between the optical member and an object may be filled with liquid; a first liquid collect port to collect the liquid supplied from the liquid inlet; a chamber device to control the temperature of a space where the optical member is arranged; and a gas inlet to supply a gas at higher temperature than that of the space controlled by the chamber device. The exposing apparatus performs gas supply operation which supplies a gas from the gas inlet, in parallel to at least a part of the liquid collection operation for collecting a liquid from the liquid collection port or after the completion of the liquid collection operation, while the liquid supply operation for supplying a liquid from the liquid supply port is stopped. <P>COPYRIGHT: (C)2013,JPO&INPIT |
