<p>A multi-chamber CVD system includes a plurality of substrate carriers where each substrate carrier is adapted to support at least one substrate. A plurality of enclosures are each configured to form a deposition chamber enclosing one of the plurality of substrate carriers to maintain an independent chemical vapor deposition process chemistry for performing a processing step. A transport mechanism transports each of the plurality of substrate carriers to each of the plurality of enclosures in discrete steps that allow processing steps to be performed in the plurality of enclosures for a predetermined time. In some embodiments, the substrate carrier can be rotatable.</p>
申请公布号
WO2013012549(A2)
申请公布日期
2013.01.24
申请号
WO2012US45179
申请日期
2012.07.02
申请人
VEECO INSTRUMENTS INC.;PARANJPE, AJIT;ARMOUR, ERIC A.;QUINN, WILLIAM E.