发明名称 METHODS AND APPARATUS FOR PROCESSING SUBSTRATES USING MODEL-BASED CONTROL
摘要 Methods and apparatus are disclosed herein. In some embodiments, methods of controlling process chambers may include predetermining a relationship between pressure in a processing volume and a position of an exhaust valve as a function of a process parameter; setting the process chamber to a first state having a first pressure in the processing volume and a first value of the process parameter, wherein the exhaust valve is set to a first position based on the predetermined relationship to produce the first pressure at the first value; determining a pressure control profile to control the pressure as the process chamber is changed to a second state having a second pressure and a second process parameter value from the first state; and applying the pressure control profile to control the pressure by varying the position of the exhaust valve while changing the process chamber to the second state.
申请公布号 WO2013012675(A2) 申请公布日期 2013.01.24
申请号 WO2012US46452 申请日期 2012.07.12
申请人 APPLIED MATERIALS, INC.;PORTHOUSE, KEITH, BRIAN;LANE, JOHN, W.;GREGOR, MARIUSCH;MERRY, NIR;RICE, MICHAEL, R.;MINKOVICH, ALEX;LI, HONGBIN;DZILNO, DMITRY, A. 发明人 PORTHOUSE, KEITH, BRIAN;LANE, JOHN, W.;GREGOR, MARIUSCH;MERRY, NIR;RICE, MICHAEL, R.;MINKOVICH, ALEX;LI, HONGBIN;DZILNO, DMITRY, A.
分类号 H01L21/205;H01L21/02;H01L21/3065 主分类号 H01L21/205
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