发明名称 PEELING APPARATUS, PEELING SYSTEM, PEELING METHOD, PROGRAM, AND COMPUTER STORAGE MEDIUM
摘要 <P>PROBLEM TO BE SOLVED: To properly and efficiently perform a peeling process of a support substrate and a processed substrate. <P>SOLUTION: A peeling apparatus 12 has: a first holding part 50 holding a processed wafer W through a dicing tape P; a second holding part 51 holding a surface of a dicing frame F at the outer side of the dicing tape P; a third holding part 52 holding a support wafer S; and a moving mechanism 90 holding an outer peripheral part of the third holding part 52 and moving the third holding part 52 in the vertical direction so that the support wafer S held by the third holding part 52 is continuously peeled from the processed wafer W, held by the first holding part 50, from the outer peripheral part side toward the center part thereof. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013016579(A) 申请公布日期 2013.01.24
申请号 JP20110147261 申请日期 2011.07.01
申请人 TOKYO ELECTRON LTD 发明人 SOMA YASUTAKA;YOSHITAKA NAOTO;HONDA MASARU;MANABE EIJI;HIRAKAWA OSAMU
分类号 H01L21/683;H01L21/304 主分类号 H01L21/683
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