发明名称 |
METHOD FOR SUPPRESSING SHORT CHANNEL EFFECT OF CMOS DEVICE |
摘要 |
A method for manufacturing a gate-last high-K CMOS structure comprising a first transistor and a second transistor, which is formed in a Si substrate includes: implanting acceptor impurity into a gate recess of the first transistor to form a first buried-layer heavily doping region under a channel of the first transistor; and implanting donor impurity into a gate recess of the second transistor to form a second buried-layer heavily doping region under a channel of the second transistor.
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申请公布号 |
US2013020652(A1) |
申请公布日期 |
2013.01.24 |
申请号 |
US201113339429 |
申请日期 |
2011.12.29 |
申请人 |
SHANGHAI HUALI MICROELECTRONICS CORPORATION;HUANG XIAOLU;MAO GANG;CHEN YUWEN;CHIU TZUYIN |
发明人 |
HUANG XIAOLU;MAO GANG;CHEN YUWEN;CHIU TZUYIN |
分类号 |
H01L21/266;H01L27/092 |
主分类号 |
H01L21/266 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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