发明名称 METHOD FOR MANUFACTURING MICRO STRUCTURE USING X-RAY EXPOSURE
摘要 <p>Provided is a method for fabricating a microstructure. The method includes disposing an X-ray mask on photosensitive material and exposing the photosensitive material by radiating X-rays to the photosensitive material using a side exposure scheme, etching the exposed photosensitive material, forming a mold having a micro-pattern by filing the etched photosensitive material with metal, forming a mold module by combining a plurality of molds, and forming a microstructure using the mold module.</p>
申请公布号 EP2355136(A4) 申请公布日期 2013.01.23
申请号 EP20090824960 申请日期 2009.11.02
申请人 POSTECH ACADEMY-INDUSTRY FOUNDATION 发明人 KWON, TAI-HUN;LEE, BONG-KEE;KIM, DONG SUNG
分类号 G03F7/00;B81C99/00;G03F7/20 主分类号 G03F7/00
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