发明名称 |
METHOD FOR MANUFACTURING MICRO STRUCTURE USING X-RAY EXPOSURE |
摘要 |
<p>Provided is a method for fabricating a microstructure. The method includes disposing an X-ray mask on photosensitive material and exposing the photosensitive material by radiating X-rays to the photosensitive material using a side exposure scheme, etching the exposed photosensitive material, forming a mold having a micro-pattern by filing the etched photosensitive material with metal, forming a mold module by combining a plurality of molds, and forming a microstructure using the mold module.</p> |
申请公布号 |
EP2355136(A4) |
申请公布日期 |
2013.01.23 |
申请号 |
EP20090824960 |
申请日期 |
2009.11.02 |
申请人 |
POSTECH ACADEMY-INDUSTRY FOUNDATION |
发明人 |
KWON, TAI-HUN;LEE, BONG-KEE;KIM, DONG SUNG |
分类号 |
G03F7/00;B81C99/00;G03F7/20 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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