发明名称 PRODUCTION OF SILICON CARBIDE SINGLE CRYSTAL AND SINGLE CRYSTAL-PRODUCING APPARATUS
摘要 PROBLEM TO BE SOLVED: To form a silicon carbide single crystal so as to have a shape to be finally used as a wafer. SOLUTION: When placing a guide 7 in the vicinity of a silicon carbide single crystal substrate 3 so as to surround the circumference of the substrate 3 and to grow a silicon carbide single crystal 10, the growth of the single crystal 10 toward the guide direction is controlled by making the guide 7 have a higher temperature than the sublimation temperature of silicon carbide. To be concrete, when the guide 7 is made to have the shape of a nearly hollow hexagonal cylinder, the silicon carbide single crystal 10 of the hexagonal cylinder can be produced. When a diagonal line which passes through the apex of the hexagon and the center of the hexagon accords with the direction of <112-0> or <11-00> of the silicon carbide single crystal substrate 3, the silicon carbide single crystal 10 registered in this direction is obtained.
申请公布号 JP2000336000(A) 申请公布日期 2000.12.05
申请号 JP20000079347 申请日期 2000.03.16
申请人 DENSO CORP 发明人 KURIYAMA HARUNOBU;KONDO HIROYUKI;ONDA SHOICHI;HARA KAZUTO
分类号 C30B29/36;(IPC1-7):C30B29/36 主分类号 C30B29/36
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