发明名称 FILLER FOR FILLING A GAP, METHOD FOR PREPARING THIS AND METHOD FOR MANUFACTURING SEMICONDUCTOR CAPACITOR USING THE SAME
摘要 PURPOSE: A filter for filling a gap, a manufacturing method thereof, and a method for manufacturing a semiconductor capacitor are provided to improve the uniformity of a thickness and the dispersion of solutions by including surfactant of 0.001 to 10 weight%. CONSTITUTION: A mold oxide layer(3) is formed on a semiconductor substrate(1). A gap exposing a contact plug of a semiconductor substrate by the photolithography of the mold oxide layer. A conductive layer(5) is formed on the semiconductor substrate and the mold oxide layer. A filling layer(7) is formed on the conductive layer. The conductive layer located on the upper side of the mold oxide layer is partially removed.
申请公布号 KR20130009509(A) 申请公布日期 2013.01.23
申请号 KR20110070672 申请日期 2011.07.15
申请人 CHEIL INDUSTRIES INC. 发明人 PARK, EUN SU;KIM, BONG HWAN;LIM, SANG HAK;KWAK, TAEK SOO;BAE, JIN HEE;YUN, HUI CHAN;KIM, SANG KYUN;LEE, JIN WOOK
分类号 H01L21/8242;H01L21/318;H01L27/108 主分类号 H01L21/8242
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