发明名称 |
FILLER FOR FILLING A GAP, METHOD FOR PREPARING THIS AND METHOD FOR MANUFACTURING SEMICONDUCTOR CAPACITOR USING THE SAME |
摘要 |
PURPOSE: A filter for filling a gap, a manufacturing method thereof, and a method for manufacturing a semiconductor capacitor are provided to improve the uniformity of a thickness and the dispersion of solutions by including surfactant of 0.001 to 10 weight%. CONSTITUTION: A mold oxide layer(3) is formed on a semiconductor substrate(1). A gap exposing a contact plug of a semiconductor substrate by the photolithography of the mold oxide layer. A conductive layer(5) is formed on the semiconductor substrate and the mold oxide layer. A filling layer(7) is formed on the conductive layer. The conductive layer located on the upper side of the mold oxide layer is partially removed.
|
申请公布号 |
KR20130009509(A) |
申请公布日期 |
2013.01.23 |
申请号 |
KR20110070672 |
申请日期 |
2011.07.15 |
申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
PARK, EUN SU;KIM, BONG HWAN;LIM, SANG HAK;KWAK, TAEK SOO;BAE, JIN HEE;YUN, HUI CHAN;KIM, SANG KYUN;LEE, JIN WOOK |
分类号 |
H01L21/8242;H01L21/318;H01L27/108 |
主分类号 |
H01L21/8242 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|