发明名称 METHOD FOR MACHINING OPTICAL DEVICE WAFER
摘要 <p>PURPOSE: A method for processing an optical device wafer is provided to prevent damage to an optical device layer by absorbing the energy of pulse laser beams in a buffer layer. CONSTITUTION: A laser processing device includes a chuck table(51) and a laser beam radiating unit(52). The chuck table maintains an optical device wafer(2) on a maintaining surface. The laser beam radiating unit includes a cylindrical casing which is horizontally arranged. A pulse laser beam oscillating unit is installed in the casing. A collector(522) is mounted on the end of the casing to collect pulse laser beams.</p>
申请公布号 KR20130009637(A) 申请公布日期 2013.01.23
申请号 KR20120075028 申请日期 2012.07.10
申请人 DISCO CORPORATION 发明人 MORIKAZU HIROSHI;NISHINO YOKO
分类号 H01L21/78;H01L21/301 主分类号 H01L21/78
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