SUBSTRATE TRAY HANDLING APPARATUS AND DEPOSITION APPARATUS COMPRISING THE SAME, AND SUBSTRATE TRAY HANDLING METHOD

摘要

PURPOSE: A substrate tray handling device, a deposition apparatus including the same, and a method for handling a substrate tray are provided to improve yield and deposition uniformity by downwardly tilting a substrate tray to prevent the contamination of the deposition surface of the substrate. CONSTITUTION: A mask aligner(13) is installed on the outer side of a chamber(11) and controls the location of a pattern mask(2). A deposition source(12) supplies deposition materials to a deposition surface of the substrate. A substrate handling device(100) includes a substrate tray support device(110) and a tilting device(120). The substrate tray support device supports an erected substrate tray(3) to face the deposition source of a chamber. The tilting device tilts the substrate tray supported by the substrate tray support device at a preset angle.