发明名称 GAS-GENERATING STRUCRURE AND ELECTROCHEMICAL DEVICE COMPRISING THE SAME
摘要 A gas-generating strucrure is provided to generate the gas only at a constant temperature(T) or greater, to control a gas generation temperature and to used in the whole industry because the kind of the usable compound is of very wide range. A gas-generating strucrure comprises (a) the first compound, (b) the second compound capable of generating the gas by reacting the first compound, (c) the third compound having a melting point which does not cause chemical reaction of the first compound and the second compound and has a melting point lower than those of the first compound and the second compound; and (d) the fourth compound capable of inducing the gas generation chemical reaction of the first compound and the second compound by dissolving at least one of the first compound and the second compound. The physical contact of the fourth compound and the first compound, and the physical contact of the second compound and fourth compound or both are blocked by the third compound. If the third compound is melted at a constant temperature(T) or greater, at least one of the first compound and the second compound is dissolved in the fourth compound while contacting the fourth compound, thereby causing the gas generation chemical reaction of the second compound and the first compound.
申请公布号 KR101225851(B1) 申请公布日期 2013.01.23
申请号 KR20070047154 申请日期 2007.05.15
申请人 发明人
分类号 H01M8/04;H01M8/06 主分类号 H01M8/04
代理机构 代理人
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