| 摘要 |
In an electron-beam generation device and an image forming apparatus which can suppress undesirable discharge, there are provided an electron-source substrate having electron emitting devices, and a facing substrate disposed so as to face the electron-source substrate. An anode-potential regulating region which a potential to accelerate electrons emitted from the electron emitting devices is applied on, a conductive member, disposed around the anode-potential regulating region with a predetermined interval therewith, which a predetermined potential is applied on, a resistive film contacting the anode-potential regulating region and the conductive member, and a projection, positioned between the anode-potential regulating region and the conductive member, which is convex with respect to the electron-source substrate are provided on the facing substrate.
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