发明名称 |
SEMI-POLAR OR NON-POLAR NITRIDE SEMICONDUCTOR SUBSTRATE, DEVICE, AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A semi-polar or non-polar nitride semiconductor substrate, a device and a method for manufacturing the same are provided to laterally grow nitride layer and to reduce defects in multi-quantum wells. CONSTITUTION: A mask layer(302) is deposited on a substrate. A patterning process is performed on the mask layer. An opening part is formed by the patterning process. A nitride layer(303) is horizontally and vertically grown through the opening part. Multi-quantum well layer(305) is grown in the upper part of the nitride layer.
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申请公布号 |
KR20130008721(A) |
申请公布日期 |
2013.01.23 |
申请号 |
KR20110069232 |
申请日期 |
2011.07.13 |
申请人 |
PAN-XAL CO., LTD. |
发明人 |
KIM, SI YOUNG;YOON, JAE MIN |
分类号 |
H01L33/16;H01L33/04 |
主分类号 |
H01L33/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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