发明名称 SEMI-POLAR OR NON-POLAR NITRIDE SEMICONDUCTOR SUBSTRATE, DEVICE, AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A semi-polar or non-polar nitride semiconductor substrate, a device and a method for manufacturing the same are provided to laterally grow nitride layer and to reduce defects in multi-quantum wells. CONSTITUTION: A mask layer(302) is deposited on a substrate. A patterning process is performed on the mask layer. An opening part is formed by the patterning process. A nitride layer(303) is horizontally and vertically grown through the opening part. Multi-quantum well layer(305) is grown in the upper part of the nitride layer.
申请公布号 KR20130008721(A) 申请公布日期 2013.01.23
申请号 KR20110069232 申请日期 2011.07.13
申请人 PAN-XAL CO., LTD. 发明人 KIM, SI YOUNG;YOON, JAE MIN
分类号 H01L33/16;H01L33/04 主分类号 H01L33/16
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