发明名称 METHOD FOR SENSING OF SUBSTRATE AND DEVICE FOR SENSING OF SUBSTRATE IN APPARATUS FOR MANUFACTURING OF FPD
摘要 PURPOSE: A method and a device for sensing a substrate in an FPD manufacturing apparatus are provided to reduce a sensing distance by setting a sensing unit in the moving path of a gate valve assembly. CONSTITUTION: A sensing unit is installed at the moving path(102) of a gate valve assembly(100). The sensing unit senses the damage of a substrate. The sensing unit includes a laser sensor(200) and a reflecting plate(210). The sensing unit operates when a gate valve(110) opens gate slits(32,22) of chambers.
申请公布号 KR20130009713(A) 申请公布日期 2013.01.23
申请号 KR20120141420 申请日期 2012.12.06
申请人 LIGADP CO., LTD. 发明人 KIM, EUN SUK
分类号 G02F1/13;H05B33/10 主分类号 G02F1/13
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