| 摘要 |
A lithographic apparatus includes: a light-shielding plate which includes, on an edge thereof, an arc overlapping with a circular boundary line that defines a region onto which the pattern is transferred and is located inside an outer periphery of a substrate, and blocks the light to prevent the light from being incident on an outer peripheral region located outside the circular boundary line; a first driving unit which rotates the light-shielding plate about an axis parallel to an optical axis of the irradiation system; and a second driving unit which linearly drives the light-shielding plate within a plane perpendicular to the optical axis. |
