| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a patterning process which ensures increased resolution property and process margin and high throughput, does not require an etching device for dry development, and achieves resolution comparable to that by double dipole lithography. <P>SOLUTION: The patterning process using positive/negative reversal includes: applying a chemically amplified positive resist material comprising a resin comprising acid labile group-containing repeating units, a photoacid generator or this generator and a thermal acid generator, and an organic solvent, onto a substrate to be processed, and removing the solvent to form a resist film; exposing the resist film to high-energy radiation through a phase shift mask having an array of chromeless shifters, heating it to bring the acid labile groups into elimination reaction, and then developing it to form a positive pattern; illuminating or heating the positive pattern to eliminate the acid labile groups for increasing alkali solubility and to induce crosslinking for imparting organic solvent resistance; forming a reversal film with a reversal film forming composition; and dissolving away the positive pattern in an alkaline wet etchant. <P>COPYRIGHT: (C)2010,JPO&INPIT |
