发明名称 |
Capacitive pressure sensor manufacturing method involves attaching etching mask over diamond shaped pressure sensor structures, such that ends of slots in etching mask coincides with corners of pressure sensor structure |
摘要 |
<p>A etching mask (18) is provided with slots (19) oriented in direction (110). The etching mask is attached over a diamond shaped pressure sensor structures to be etched on silicon wafer oriented along the specific direction (100), such that the ends of slots in the etching mask coincides with the corners of the pressure sensor structure. An independent claim is also included for capacitive pressure sensor.</p> |
申请公布号 |
FI115487(B) |
申请公布日期 |
2005.05.13 |
申请号 |
FI20040000629 |
申请日期 |
2004.05.03 |
申请人 |
VTI TECHNOLOGIES OY, |
发明人 |
RUOHIO,JAAKKO;AASTROEM,RIIKKA |
分类号 |
G01L9/00;(IPC1-7):G01L9/12 |
主分类号 |
G01L9/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|