Lithographic systems and methods with extended depth of focus
摘要
Apparatus for increasing the depth of focus in a lithographic system, comprising: optics for imaging a reticle or photomask onto a lithographic recording medium having a threshold of exposure; a pupil plane function that alters the aerial image of the lithographic imaging system such that part of the aerial image is above a recording threshold of the lithographic recording medium over the extended depth of focus, the pupil plane function altering a system response function and the aerial image by affecting phase of a wavefront imaged by the optics.
申请公布号
EP2296041(A3)
申请公布日期
2013.01.23
申请号
EP20100010213
申请日期
2004.06.01
申请人
OMNIVISION TECHNOLOGIES, INC.
发明人
DOWSKI, EDWARD, RAYMOND JR.;JOHNSON, GREGORY, E.;KUBALA, KENNETH, SCOTT;WADE, THOMAS, CATHEY JR.