SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to prevent a vacuum leakage by closely adhering a first chamber member and a second chamber member with an additional clamping unit. CONSTITUTION: A vacuum chamber(100) includes a first chamber member(110) and a second chamber member(120). A sealed process space is formed by combining the second chamber member with the first chamber member. A substrate(10) is received in a substrate tray(20) and is transferred to the processing device. A pair of O-rings are installed on the contact surface between the first chamber member and the second chamber member. A first clamping unit(310) and a second clamping unit(320) closely adhere the first chamber member and the second chamber member. [Reference numerals] (AA) Horizontal movement