MANUFACTURING METHOD FOR THIN FILM TRANSISTOR SUBSTRATE

摘要

A method of manufacturing a thin film transistor array panel is provided to simplify a manufacturing process by forming photoresist patterns through a printing method. An insulating substrate(110) is prepared. A gate electrode(122) is formed on the insulating substrate. A gate insulating layer(130), a semiconductor layer(140), an ohmic contact layer(151,152) and a data line layer(162,163) are sequentially formed on the insulating substrate. A first photoresist film corresponding to the gate electrode is transferred onto the data line layer using Gravure printing. A second photoresist film thicker than the first photoresist film is transferred onto the region surrounding the first photoresist film using Gravure printing. A source electrode(162), a drain electrode(163) and a channel are formed through an etch process using the first and second photoresist films.