| 摘要 |
PURPOSE: A vacuum heat treatment device is provided to increase a yield of a compound powder by optimizing a shape of a reaction container to prevent a scattering phenomenon of the compound powder in the reaction container. CONSTITUTION: A vacuum heat treatment includes a chamber, a reaction container(30), and a heating member. The reaction container is positioned in the chamber. The heating member heats the reaction container in the chamber. The reaction container comprises a space therein, a container portion(32) with one side open, and a cover portion(34) covering the container portion. A lower surface of the cover portion comprises an insert region that is inserted to the space. A thickness of the insert region satisfies 1/3 to 3/5 of a depth of the container portion. A plane section of the reaction container is formed of a curved surface. The lower surface of the insert region has a groove(322).
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