发明名称 |
Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin |
摘要 |
The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
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申请公布号 |
US8357483(B2) |
申请公布日期 |
2013.01.22 |
申请号 |
US20080450661 |
申请日期 |
2008.04.11 |
申请人 |
LG CHEM, LTD.;KIM HAN-SOO;LIM MIN-YOUNG;HEO YOON-HEE;YOO JI-HEUM;KIM SUNG-HYUN;PARK KWANG-HAN |
发明人 |
KIM HAN-SOO;LIM MIN-YOUNG;HEO YOON-HEE;YOO JI-HEUM;KIM SUNG-HYUN;PARK KWANG-HAN |
分类号 |
G03F7/033;C08F224/00;G03F7/032;G03F7/037 |
主分类号 |
G03F7/033 |
代理机构 |
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地址 |
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