发明名称 半导体积体电路之设计方法、半导体积体电路之设计装置、记录媒体、及光罩制造方法
摘要 [课题]不降低筛选精度,简化半导体积体电路之设计;。;[解决手段]藉由半导体积体电路设计资料来生成半导;体积体电路之实体布局之际的半导体积体电路之设计方法,其特征为,具有:元件配置配线工程,系将生成实体布局所需之元件予以配置并配线;和设计规则检查工程,系参照着设计规则检查用之规则函式库,将含有实体布局之元件的第2实体布局之形状,加以验证;和光罩资料处理工程,系当不满足前记设计规则时,进行身为验证对象之第2实体布局的光罩资料处理;和光罩资料作成工程,使用光罩资料处理工程中进行过光罩资料处理的第2实体布局,来作成光罩资料;和光罩资料作成工程,系当满足设计规则时,使用第2实体布局,来作成对应于实体布局的光罩资料。;A method of designing a semiconductor integrated circuit includes a cell arranging and wiring step of arranging and wiring cells for creating a physical layout, a design-rule checking step of verifying a shape of a second physical layout including the cells of the physical layout with reference to a ruIe library for design rule check, a mask-data creating step of creating mask data corresponding to the physical layout using the second physical layout when the design rule is satisfied in the design-rule checking step, a mask-data processing step of performing, when the design rule is not satisfied in the design-rule checking step, mask data processing for the verification-object second physical layout, and a mask-data creating step for creating mask data corresponding to the physical layout using the second physical layout subjected to the mask data processing in the mask-data processing step.
申请公布号 TWI383308 申请公布日期 2013.01.21
申请号 TW097109535 申请日期 2008.03.18
申请人 新力股份有限公司 日本 发明人 出羽恭子
分类号 G06F17/50;H01L21/027;H01L21/30 主分类号 G06F17/50
代理机构 代理人 林志刚 台北市中山区南京东路2段125号7楼
主权项
地址 日本