发明名称 STATIC ELIMINATOR OF GLASS SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To irradiate a soft X-ray correctly in a narrow gap immediately after lifting up a glass substrate. SOLUTION: The soft X-ray from a soft X-ray static eliminator 14 is introduced into a spacing (d), it is detected by a soft X-ray optical axis monitor 16, an optical axis adjustment is performed by adjusting a mounting position adjusting means 15 with the detected output. Then, based on the information of a database 19, static elimination is performed while a control unit 17 controls a space adjusting means 13. Moreover, the static elimination can be performed by controlling the spacing (d) by the spacing adjusting means 13 while judging the elimination status by the control unit 17 whether the electro-static charge voltage potential measured by an electrometer 18 is within a allowed value. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007220898(A) 申请公布日期 2007.08.30
申请号 JP20060039471 申请日期 2006.02.16
申请人 FUTURE VISION:KK 发明人 INABA HITOSHI;FUJINO MASAHARU;FUKUCHI YASUHIKO;NAKAJIMA KAZUYOSHI;FURUCHI MASATO
分类号 H01L21/683;G02F1/13;G02F1/1333;H05F3/06 主分类号 H01L21/683
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