| 摘要 |
<p>PURPOSE: A manufacturing method of blank-mask capable of easily removing used adhesive, a manufacturing method thereof and a photomask are provided to suppress movement of adhesive to the inner field area. CONSTITUTION: A blank-mask comprises a transparent substrate(100) and mask layers(200). The transparent substrate comprises a field area of the inner side and a frame area of the outside. The mask layer is formed at the transparent substrate. The mask layer has sticking grooves(211). The low-end of pellicle frame(410) which supports a pellicle film(400) exposes a part of field area of the transparent substrate in order to be inserted. The sticking grooves are formed in a square ring shape. [Reference numerals] (AA,CC) Frame area; (BB) Field area</p> |
