发明名称 STACK STRUCTURE HAVING TWO-DIMENSIONAL ELECTRON GAS, SEMICONDUCTOR DEVICE INCLUDING THE STACK STRUCTURE AND METHODS OF MANUFACTURING THE SAME
摘要 PURPOSE: A laminate structure with 2D electronic gas, a semiconductor device including the same, and a manufacturing method thereof are provided to prevent the crystallization deterioration of a first semiconductor layer by forming a buffer layer between a substrate and the first semiconductor layer to reduce a lattice coefficient and a thermal expansion coefficient between the substrate and the first semiconductor layer. CONSTITUTION: A first semiconductor layer(10) is formed on a substrate(SUB1). The semiconductor layer includes a III-V semiconductor. The first semiconductor layer is thermally processed. A second semiconductor layer(20) is formed on the thermally processed first semiconductor layer. 2D electronic gas is formed on the first semiconductor layer by the second semiconductor layer.
申请公布号 KR20130006870(A) 申请公布日期 2013.01.18
申请号 KR20110061798 申请日期 2011.06.24
申请人 SAMSUNG ELECTRONICS CO., LTD.;KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION 发明人 CHOI, HYUK SOON;LEE, JUNG HEE;SHIN, JAI KWANG;OH, JAE JOON;HA, JONG BONG;KIM, JONG SEOB;HWANG, IN JUN;HONG, KI HA;IM, KI SIK;KIM, KI WON;KIM, DONG SEOK
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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