发明名称 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
摘要 PURPOSE: An apparatus and a method for processing a substrate are provided to precisely control the temperature of a substrate that a stepper requires by detecting the temperature of the substrate heading toward the stepper and detecting the internal temperature of an interface block. CONSTITUTION: A substrate transferring tool transfers temperature-controlled substrates from a temperature controlling plate(53) to a stepper(S4). A first temperature detecting part(70) detects the temperature of a part corresponding to the temperature of the temperature controlling plate. The control part controls a temperature controlling tool based on temperature values detected in the first temperature detecting part and a predetermined temperature set value. A second temperature detecting part(7) detects the temperature of environment to transfer the substrates or the temperature of the transferred substrates. A set value adjusting part adjusts the temperature set value based on temperature values detected in the second temperature detecting part. [Reference numerals] (43) Memory; (44) Program
申请公布号 KR20130007476(A) 申请公布日期 2013.01.18
申请号 KR20120070460 申请日期 2012.06.29
申请人 TOKYO ELECTRON LIMITED 发明人 HAYASHI SHINICHI;KANAGAWA KOUZOU;ENOKIDA SUGURU
分类号 H01L21/027 主分类号 H01L21/027
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