发明名称 |
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD |
摘要 |
PURPOSE: An apparatus and a method for processing a substrate are provided to precisely control the temperature of a substrate that a stepper requires by detecting the temperature of the substrate heading toward the stepper and detecting the internal temperature of an interface block. CONSTITUTION: A substrate transferring tool transfers temperature-controlled substrates from a temperature controlling plate(53) to a stepper(S4). A first temperature detecting part(70) detects the temperature of a part corresponding to the temperature of the temperature controlling plate. The control part controls a temperature controlling tool based on temperature values detected in the first temperature detecting part and a predetermined temperature set value. A second temperature detecting part(7) detects the temperature of environment to transfer the substrates or the temperature of the transferred substrates. A set value adjusting part adjusts the temperature set value based on temperature values detected in the second temperature detecting part. [Reference numerals] (43) Memory; (44) Program
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申请公布号 |
KR20130007476(A) |
申请公布日期 |
2013.01.18 |
申请号 |
KR20120070460 |
申请日期 |
2012.06.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HAYASHI SHINICHI;KANAGAWA KOUZOU;ENOKIDA SUGURU |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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