| 摘要 |
A semiconductor processing apparatus is provided to prevent a leakage problem caused by a level difference of dual sealing by forming a gas guiding part in addition to a chamber body and by separately sealing the chamber body and the gas guiding part. A chamber body is covered with a cover plate. Gas is supplied to the inside of the chamber body through a first gas flow path installed in the cover plate. A gas guiding part(200) is separated from the chamber body, including a second gas flow path connected to the first gas flow path. The first and second gas flow paths are sealed by a sealing member, connected to each other. The gas guiding part is supported by a support block(400). The gas guiding part and the support block can be coupled to each other, capable of transferring within a predetermined interval. |
