HALFTONE MASK AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME

摘要

PURPOSE: A halftone mask and a manufacturing method of array panels using the same are provided to increase reaction are of ashing gas and photoresist. CONSTITUTION: A halftone mask (230) comprises a translucent area(234) which all cuts off light which all transmits light and transmission region(232) and a cut-off region(236). The permeability of the light of the translucent area is an interval of permeability of the light at the permeability of the light at the transmission region and cut-off region. The translucent area comprises a first translucent area which is for forming a plurality of patterns in embossing shape and a second translucent area.