发明名称 TEMPERATURE MEASURING SYSTEM, SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE MEASURING METHOD
摘要 PURPOSE: A temperature measuring system, a substrate processing device, and a temperature measuring method are provided to properly measure temperature by using optical interference. CONSTITUTION: A temperature measuring system(1) comprises a light source(10), a spectroscope(14), light transmitting tools(11,12), an optical path length calculating unit, and a temperature calculating unit. The light source has frequencies penetrating a measurement object. The spectroscope measures intensity dispersion caused by the frequencies and wavelengths. The light transmitting tools are connected to the light source and spectroscope, projects measurement lights to a first major surface of the measurement object, and simultaneously projects reflected lights from the first major surface and a second major surface to the spectroscope. The optical path length calculating unit performs a Fourier-transform interference intensity dispersion, which is the intensity dispersion of the reflected lights from the first and second major surfaces, thereby calculating the length of the optical path. The temperature calculating unit calculates the temperature of the measurement object on a basis of a relation of the length of the optical path calculated by the optical path length calculating unit, the length of the optical path and the temperature of the measurement object. [Reference numerals] (10) Light source; (14) Spectroscope
申请公布号 KR20130007451(A) 申请公布日期 2013.01.18
申请号 KR20120067411 申请日期 2012.06.22
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUDO TATSUO;NAGAI KENJI
分类号 G01K11/12;G01J5/00;H01L21/66 主分类号 G01K11/12
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