PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A plasma processing apparatus is provided to suppress plasma potential by suppressing potential of an antenna. CONSTITUTION: Induction field is generated inside of a vacuum container(4) by applying high frequency current generated from a high frequency power supply(42) to an antenna(30). A substrate(2) is processed using plasma(50) generated by corresponding induction electric field. The inside of the vacuum container is vacuum-exhausted by a vacuum exhaust apparatus(8). Gas(24) is flew into the inside of the vacuum container through a gas inlet pipe(22). A holder(10) supporting a substrate is installed inside of the vacuum container. The holder is supported by a shaft(16). An insulation frame(38) is interposed in an opening part(7) of the ceiling surface(6) of the vacuum container. The antenna consists of traveling conductors(31,32) arranged in the vertical direction.